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Extending ArF to the 65-nm node with full-phase lithography
Publication:
Extending ArF to the 65-nm node with full-phase lithography
Date
2003
Proceedings Paper
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7996.pdf
2.07 MB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Driessen, Frank
;
Pierrat, C.
;
Vandenberghe, Geert
;
Ronse, Kurt
;
Van Adrichem, Paul
;
Liu, H.Y.
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Abstract
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1955
since deposited on 2021-10-15
Acq. date: 2025-10-23
Citations
Metrics
Views
1955
since deposited on 2021-10-15
Acq. date: 2025-10-23
Citations