Publication:

Vapor-phase deposition of N3-containing monolayers on SiO2 and Si3N4 for wafer scale biofunctionalization

Date

2018
Proceedings Paper
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dc.contributor.authorVos, Rita
dc.contributor.authorSteylaerts, Tim
dc.contributor.authorFranquet, Alexis
dc.contributor.authorMoussa, Alain
dc.contributor.authorStakenborg, Tim
dc.contributor.authorJans, Karolien
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorSteylaerts, Tim
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorMoussa, Alain
dc.contributor.imecauthorStakenborg, Tim
dc.contributor.imecauthorJans, Karolien
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecStakenborg, Tim::0000-0001-9878-9078
dc.date.accessioned2021-10-26T08:54:46Z
dc.date.available2021-10-26T08:54:46Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/32226
dc.identifier.urlhttps://www.scientific.net/SSP.282.31
dc.source.beginpage31
dc.source.conferenceUltra Clean Processing of Semiconductor Surfaces XIV - UCPSS
dc.source.conferencedate3/09/2018
dc.source.conferencelocationLeuven Belgium
dc.source.endpage36
dc.title

Vapor-phase deposition of N3-containing monolayers on SiO2 and Si3N4 for wafer scale biofunctionalization

dc.typeProceedings paper
dspace.entity.typePublication
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