Publication:

Enablement of 0.55NA EUV Bright Field Mask Stitching

Date

2025
Proceedings Paper
https://doi.org/10.1117/12.3051285
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cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.orcid0000-0002-2430-7360
cris.virtualsource.department7a43e54d-9897-45de-884c-e7dcd19acb63
cris.virtualsource.orcid7a43e54d-9897-45de-884c-e7dcd19acb63
dc.contributor.authorXu, Dongbo
dc.contributor.authorZeng, Qinglin
dc.contributor.authorGillijns, Werner
dc.contributor.authorZeng, Xuefeng
dc.contributor.authorSun, Yuyang
dc.contributor.authorFenger, Germain
dc.contributor.imecauthorGillijns, Werner
dc.contributor.orcidimecGillijns, Werner::0000-0002-2430-7360
dc.date.accessioned2025-07-31T04:00:03Z
dc.date.available2025-07-31T04:00:03Z
dc.date.issued2025
dc.description.wosFundingTextThis work is partially founded by the European Union by 10ACE (Project: 101139972 - 10ACe - HORIZON-KDT-JU-2023-1-IA). Views and opinions expressed are however those of the author(s) only and do not necessarily reflect those of the European Union or the Chips Joint Undertaking. Neither the European Union nor the granting authority can be held responsible for them.
dc.identifier.doi10.1117/12.3051285
dc.identifier.eisbn978-1-5106-8635-9
dc.identifier.isbn978-1-5106-8634-2
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/45990
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage134240J-1
dc.source.conference2025 Conference on Optical and EUV Nanolithography
dc.source.conferencedate2025-04-25
dc.source.conferencelocationSan Jose
dc.source.endpage134240J-9
dc.source.journalProceedings of SPIE
dc.source.numberofpages9
dc.title

Enablement of 0.55NA EUV Bright Field Mask Stitching

dc.typeProceedings paper
dspace.entity.typePublication
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