Atomic layer deposition of Al2O3 for industrial local Al back-surface field (BSF) solar cells

dc.contributor.author	Rothschild, Aude
dc.contributor.author	Vermang, Bart
dc.contributor.author	Goverde, Hans
dc.contributor.imecauthor	Vermang, Bart
dc.contributor.orcidimec	Vermang, Bart::0000-0003-2669-2087
dc.date.accessioned	2021-10-19T18:18:16Z
dc.date.available	2021-10-19T18:18:16Z
dc.date.issued	2011
dc.identifier.issn	1757-1197
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/19710
dc.source.beginpage	92
dc.source.endpage	101
dc.source.issue	13
dc.source.journal	Photovoltaics International. The Technology Resource for PV Professionals
dc.title	Atomic layer deposition of Al2O3 for industrial local Al back-surface field (BSF) solar cells
dc.type	Journal article
dspace.entity.type	Publication
Files
Publication available in collections:	Articles

Date