A novel approach for the elimination of the pattern density dependence of CMP for shallow trench isolation

dc.contributor.author	Grillaert, Joost
dc.contributor.author	Heylen, Nancy
dc.contributor.author	Vrancken, Evi
dc.contributor.author	Badenes, Gonçal
dc.contributor.author	Rooyackers, Rita
dc.contributor.author	Meuris, Marc
dc.contributor.author	Heyns, Marc
dc.contributor.imecauthor	Heylen, Nancy
dc.contributor.imecauthor	Vrancken, Evi
dc.contributor.imecauthor	Meuris, Marc
dc.contributor.imecauthor	Heyns, Marc
dc.contributor.orcidimec	Meuris, Marc::0000-0002-9580-6810
dc.date.accessioned	2021-09-30T12:02:34Z
dc.date.available	2021-09-30T12:02:34Z
dc.date.issued	1998
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/2595
dc.source.beginpage	313
dc.source.conference	Proceedings of the 3rd International Chemical-Mechanical-Planarization for ULSI Multilevel Interconnection Conference - CMP-MIC
dc.source.conferencelocation
dc.source.endpage	318
dc.title	A novel approach for the elimination of the pattern density dependence of CMP for shallow trench isolation
dc.type	Proceedings paper
dspace.entity.type	Publication
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