Publication:

Evaluation of megasonic cleaning for sub-90-nm technologies

Date

2004
Presentation
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dc.contributor.authorVereecke, Guy
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorArnauts, Sophia
dc.contributor.authorKenis, Karine
dc.contributor.authorLux, Marcel
dc.contributor.authorVos, Rita
dc.contributor.authorSnow, Jim
dc.contributor.authorMertens, Paul
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorArnauts, Sophia
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorLux, Marcel
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorMertens, Paul
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.date.accessioned2021-10-15T17:36:05Z
dc.date.available2021-10-15T17:36:05Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9859
dc.source.conference7th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS
dc.source.conferencedate20/09/2004
dc.source.conferencelocationBrussel Belgium
dc.title

Evaluation of megasonic cleaning for sub-90-nm technologies

dc.typeOral presentation
dspace.entity.typePublication
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