Publication:

Toward extreme throughput nanotopography metrology with atomic force microscope arrays

Date

2025
Proceedings Paper
https://doi.org/10.1117/12.3051135
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cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.orcid0000-0002-6377-4199
cris.virtual.orcid0000-0002-7503-8922
cris.virtualsource.departmentfde8f386-0ddb-42e1-ad64-53cde7dda12d
cris.virtualsource.department9a3d60e7-3e8b-4366-b479-ea599b23d28b
cris.virtualsource.orcidfde8f386-0ddb-42e1-ad64-53cde7dda12d
cris.virtualsource.orcid9a3d60e7-3e8b-4366-b479-ea599b23d28b
dc.contributor.authorCao, Zhenle
dc.contributor.authorWang, Qianshu
dc.contributor.authorBenedict, Shawn
dc.contributor.authorMoussa, Alain
dc.contributor.authorBogdanowicz, Janusz
dc.contributor.authorMorris, David
dc.contributor.imecauthorMoussa, Alain
dc.contributor.imecauthorBogdanowicz, Janusz
dc.contributor.orcidimecMoussa, Alain::0000-0002-6377-4199
dc.contributor.orcidimecBogdanowicz, Janusz::0000-0002-7503-8922
dc.date.accessioned2025-07-28T03:57:29Z
dc.date.available2025-07-28T03:57:29Z
dc.date.issued2025
dc.identifier.doi10.1117/12.3051135
dc.identifier.eisbn978-1-5106-8639-7
dc.identifier.isbn978-1-5106-8638-0
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/45961
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage1
dc.source.conference2025 Conference on Metrology Inspection and Process Control-Annual
dc.source.conferencedate2025-02-23
dc.source.conferencelocationSan Jose
dc.source.journalProceedings of SPIE
dc.source.numberofpages8
dc.title

Toward extreme throughput nanotopography metrology with atomic force microscope arrays

dc.typeProceedings paper
dspace.entity.typePublication
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