Anisotropic etching of inverted pyramids in the sub-100 nm region

dc.contributor.author	Hantschel, Thomas
dc.contributor.author	Vandervorst, Wilfried
dc.contributor.imecauthor	Hantschel, Thomas
dc.contributor.imecauthor	Vandervorst, Wilfried
dc.contributor.orcidimec	Hantschel, Thomas::0000-0001-9476-4084
dc.date.accessioned	2021-09-30T08:23:58Z
dc.date.available	2021-09-30T08:23:58Z
dc.date.embargo	9999-12-31
dc.date.issued	1997
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/1920
dc.source.beginpage	405
dc.source.endpage	407
dc.source.journal	Microelectronic Engineering
dc.source.volume	33
dc.title	Anisotropic etching of inverted pyramids in the sub-100 nm region
dc.type	Journal article
dspace.entity.type	Publication
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