Publication:

Diagnosing and Removing CD-SEM Metrology Artifacts

Date

2021
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorMack, Chris
dc.contributor.authorLorusso, Gian
dc.contributor.authorDelvaux, Christie
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorDelvaux, Christie
dc.date.accessioned2021-10-31T09:37:57Z
dc.date.available2021-10-31T09:37:57Z
dc.date.issued2021
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/36929
dc.identifier.urlhttps://doi.org/10.1117/12.2585311
dc.source.beginpage116111B
dc.source.conferenceMetrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
dc.source.conferencedate21/02/2021
dc.source.conferencelocationSan Jose, CA USA
dc.title

Diagnosing and Removing CD-SEM Metrology Artifacts

dc.typeProceedings paper
dspace.entity.typePublication
Files
Publication available in collections:
Conference contributions