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In situ X-ray diffraction study of the controlled oxidation and reduction in the V–O system for the synthesis of VO2 and V2O3 thin films

Date

2015
Journal article
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dc.contributor.authorRampelberg, Geert
dc.contributor.authorDe Schutter, Bob
dc.contributor.authorDe Vulder, Wouter
dc.contributor.authorMartens, Koen
dc.contributor.authorRadu, Iuliana
dc.contributor.authorDetavernier, Christophe
dc.contributor.imecauthorMartens, Koen
dc.contributor.imecauthorRadu, Iuliana
dc.contributor.orcidimecMartens, Koen::0000-0001-7135-5536
dc.contributor.orcidimecRadu, Iuliana::0000-0002-7230-7218
dc.date.accessioned2021-10-22T22:07:30Z
dc.date.available2021-10-22T22:07:30Z
dc.date.issued2015
dc.identifier.issn2050-7526
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25801
dc.identifier.urlhttp://pubs.rsc.org/en/Content/ArticleLanding/2015/TC/C5TC02553B#!divAbstract
dc.source.beginpage11357
dc.source.endpage11365
dc.source.issue43
dc.source.journalJournal of Materials Chemistry C
dc.source.volume3
dc.title

In situ X-ray diffraction study of the controlled oxidation and reduction in the V–O system for the synthesis of VO2 and V2O3 thin films

dc.typeJournal article
dspace.entity.typePublication
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