Publication:

Cyclic Plasma Halogenation of Amorphous Carbon for Defect-Free Area-Selective Atomic Layer Deposition of Titanium Oxide

Date

2021
Journal article
https://doi.org/10.1021/acsami.1c04405
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dc.contributor.authorKrishtab, Mikhail
dc.contributor.authorArmini, Silvia
dc.contributor.authorMeersschaut, Johan
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorAmeloot, Rob
dc.contributor.imecauthorKrishtab, Mikhail
dc.contributor.imecauthorArmini, Silvia
dc.contributor.imecauthorMeersschaut, Johan
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidextAmeloot, Rob::0000-0003-3178-5480
dc.contributor.orcidimecKrishtab, Mikhail::0000-0001-6215-8506
dc.contributor.orcidimecArmini, Silvia::0000-0003-0578-3422
dc.contributor.orcidimecMeersschaut, Johan::0000-0003-2467-1784
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2022-03-03T14:08:18Z
dc.date.available2021-11-02T15:59:43Z
dc.date.available2022-03-03T14:08:18Z
dc.date.issued2021
dc.identifier.doi10.1021/acsami.1c04405
dc.identifier.issn1944-8244
dc.identifier.pmidMEDLINE:34160190
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/37774
dc.publisherAMER CHEMICAL SOC
dc.source.beginpage32381
dc.source.endpage32392
dc.source.issue27
dc.source.journalACS APPLIED MATERIALS & INTERFACES
dc.source.numberofpages12
dc.source.volume13
dc.subject.keywordsBLOCK-COPOLYMERS
dc.subject.keywordsBOTTOM-UP
dc.subject.keywordsSURFACE
dc.subject.keywordsTIO2
dc.subject.keywordsRUTHENIUM
dc.subject.keywordsPHASE
dc.subject.keywordsFILMS
dc.title

Cyclic Plasma Halogenation of Amorphous Carbon for Defect-Free Area-Selective Atomic Layer Deposition of Titanium Oxide

dc.typeJournal article
dspace.entity.typePublication
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