Publication:

Interplay between plasma modification of surfaces & atomic layer deposition for semiconductor applications

Date

2012
Meeting abstract
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dc.contributor.authorSwerts, Johan
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorArmini, Silvia
dc.contributor.authorDelabie, Annelies
dc.contributor.authorNyns, Laura
dc.contributor.authorPopovici, Mihaela Ioana
dc.contributor.authorSchaekers, Marc
dc.contributor.authorVerdonck, Patrick
dc.contributor.authorVan Elshocht, Sven
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorArmini, Silvia
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorNyns, Laura
dc.contributor.imecauthorPopovici, Mihaela Ioana
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecArmini, Silvia::0000-0003-0578-3422
dc.contributor.orcidimecNyns, Laura::0000-0001-8220-870X
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.accessioned2021-10-20T16:37:59Z
dc.date.available2021-10-20T16:37:59Z
dc.date.embargo9999-12-31
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21573
dc.source.beginpage2946
dc.source.conferenceECS Fall Meeting Symposium E13: Plasma Processing 19
dc.source.conferencedate8/10/2012
dc.source.conferencelocationHonolulu, HI USA
dc.title

Interplay between plasma modification of surfaces & atomic layer deposition for semiconductor applications

dc.typeMeeting abstract
dspace.entity.typePublication
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