Publication:

Controlled Stepwise Wet Etching of Polycrystalline Mo Nanowires

Date

2024
Journal article
https://doi.org/10.1002/adfm.202310838
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dc.contributor.authorSaidov, Khakimjon
dc.contributor.authorErofeev, Ivan
dc.contributor.authorAabdin, Zainul
dc.contributor.authorPacco, Antoine
dc.contributor.authorPhilipsen, Harold
dc.contributor.authorHartanto, Antony Winata
dc.contributor.authorChen, Yifan
dc.contributor.authorYan, Hongwei
dc.contributor.authorTjiu, Weng Weei
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorMirsaidov, Utkur
dc.contributor.imecauthorPacco, Antoine
dc.contributor.imecauthorPhilipsen, Harold
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.orcidimecPacco, Antoine::0000-0001-6330-5053
dc.contributor.orcidimecPhilipsen, Harold::0000-0002-5029-1104
dc.contributor.orcidimecHolsteyns, Frank::0009-0002-2123-452X
dc.date.accessioned2024-09-24T08:32:37Z
dc.date.available2023-12-23T17:24:06Z
dc.date.available2024-09-24T08:32:37Z
dc.date.embargo2023-12-12
dc.date.issued2024
dc.description.wosFundingTextThis work was supported by the Singapore National Research Foundation's Competitive Research Program funding.
dc.identifier.doi10.1002/adfm.202310838
dc.identifier.issn1616-301X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/43290
dc.publisherWILEY-V C H VERLAG GMBH
dc.source.beginpageArt. 2310838
dc.source.endpageN/A
dc.source.issue12
dc.source.journalADVANCED FUNCTIONAL MATERIALS
dc.source.numberofpages9
dc.source.volume34
dc.subject.keywordsLINE-EDGE ROUGHNESS
dc.subject.keywordsRESISTIVITY
dc.subject.keywordsTECHNOLOGY
dc.subject.keywordsFUTURE
dc.title

Controlled Stepwise Wet Etching of Polycrystalline Mo Nanowires

dc.typeJournal article
dspace.entity.typePublication
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