Publication:
Probability prediction of EUV process failure due to resist-exposure stochastic: applications of Gaussian random fields excursions and Rice's formula
Date
| dc.contributor.author | Latypov, Azat | |
| dc.contributor.author | Khaira, Damon | |
| dc.contributor.author | Fenger, Germain | |
| dc.contributor.author | Sturtevant, John | |
| dc.contributor.author | Wei, Chih-I | |
| dc.contributor.author | De Bisschop, Peter | |
| dc.contributor.imecauthor | De Bisschop, Peter | |
| dc.date.accessioned | 2021-10-28T23:42:01Z | |
| dc.date.available | 2021-10-28T23:42:01Z | |
| dc.date.issued | 2020 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/35441 | |
| dc.identifier.url | https://doi.org/10.1117/12.2551965 | |
| dc.source.beginpage | 113230L | |
| dc.source.conference | Extreme Ultraviolet (EUV) Lithography XI; 113230L (2020) | |
| dc.source.conferencedate | 23/02/2020 | |
| dc.source.conferencelocation | San Jose USA | |
| dc.title | Probability prediction of EUV process failure due to resist-exposure stochastic: applications of Gaussian random fields excursions and Rice's formula | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
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