Publication:

Wafer level integration of plasmonic nanopore arrays into 200mm CMOS fab environment

Date

2012
Meeting abstract
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dc.contributor.authorMalachowski, Karl
dc.contributor.authorVerbeeck, Rita
dc.contributor.authorDupont, Tania
dc.contributor.authorChen, Chang
dc.contributor.authorStakenborg, Tim
dc.contributor.authorLi, Yi
dc.contributor.authorSabuncuoglu Tezcan, Deniz
dc.contributor.authorVan Dorpe, Pol
dc.contributor.imecauthorVerbeeck, Rita
dc.contributor.imecauthorDupont, Tania
dc.contributor.imecauthorStakenborg, Tim
dc.contributor.imecauthorSabuncuoglu Tezcan, Deniz
dc.contributor.imecauthorVan Dorpe, Pol
dc.contributor.orcidimecStakenborg, Tim::0000-0001-9878-9078
dc.contributor.orcidimecSabuncuoglu Tezcan, Deniz::0000-0002-9237-7862
dc.contributor.orcidimecVan Dorpe, Pol::0000-0003-0918-1664
dc.date.accessioned2021-10-20T13:08:10Z
dc.date.available2021-10-20T13:08:10Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21085
dc.source.conference4. GMM Mikro-Nano-Integration Workshop
dc.source.conferencedate12/11/2012
dc.source.conferencelocationBerlin Germany
dc.title

Wafer level integration of plasmonic nanopore arrays into 200mm CMOS fab environment

dc.typeMeeting abstract
dspace.entity.typePublication
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