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Reduction of plasma process induced damage during gate poly etching by using the SiO2 hard maks
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1921 since deposited on 2021-09-30
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Acq. date: 2025-10-25
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Views
1921 since deposited on 2021-09-30
430item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations