Publication:
Study on Next-Generation EUV Lithography Technology: Hyper NA, the Highest Potential for Practical Implementation
| dc.contributor.author | Lee, Inhwan | |
| dc.contributor.author | Franke, Joern-Holger | |
| dc.contributor.author | Philipsen, Vicky | |
| dc.contributor.author | Ronse, Kurt | |
| dc.contributor.author | De Gendt, Stefan | |
| dc.contributor.author | Hendrickx, Eric | |
| dc.contributor.imecauthor | Lee, Inhwan | |
| dc.contributor.imecauthor | Franke, Joern-Holger | |
| dc.contributor.imecauthor | Philipsen, Vicky | |
| dc.contributor.imecauthor | Ronse, Kurt | |
| dc.contributor.imecauthor | De Gendt, Stefan | |
| dc.contributor.imecauthor | Hendrickx, Eric | |
| dc.contributor.orcidimec | Lee, Inhwan::0000-0002-3283-5075 | |
| dc.contributor.orcidimec | Franke, Joern-Holger::0000-0002-3571-1633 | |
| dc.contributor.orcidimec | Philipsen, Vicky::0000-0002-2959-432X | |
| dc.contributor.orcidimec | Ronse, Kurt::0000-0003-0803-4267 | |
| dc.contributor.orcidimec | De Gendt, Stefan::0000-0003-3775-3578 | |
| dc.contributor.orcidimec | Hendrickx, Eric::0000-0003-2516-0417 | |
| dc.date.accessioned | 2025-08-28T03:56:51Z | |
| dc.date.available | 2025-08-28T03:56:51Z | |
| dc.date.issued | 2025-AUG 11 | |
| dc.description.wosFundingText | The authors gratefully acknowledge the contributions of all members of imec imaging and reticle team, especially, Peter de Bisschop for valuable discussions, and Gerardo Bottiglieri from ASML, Jens-Timo Neumann, Michael Patra, and Joerg Zimmermann from Zeiss for valuable discussions and support in this work, and Ulrich Klostermann, Ulrich Welling from Synopsys for sharing resist modeling and discussions. We used S-Litho EUV of Synopsys and Hyperlith of Panoramic Technology for simulation works. | |
| dc.identifier.doi | 10.1021/acsami.5c11891 | |
| dc.identifier.issn | 1944-8244 | |
| dc.identifier.pmid | MEDLINE:40785079 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/46124 | |
| dc.publisher | American Chemical Society | |
| dc.source.beginpage | 47719 | |
| dc.source.endpage | 47735 | |
| dc.source.issue | 17 | |
| dc.source.journal | ACS APPLIED MATERIALS & INTERFACES | |
| dc.source.numberofpages | 17 | |
| dc.source.volume | 33 | |
| dc.subject.keywords | MULTILAYER MIRRORS | |
| dc.subject.keywords | LA/B | |
| dc.title | Study on Next-Generation EUV Lithography Technology: Hyper NA, the Highest Potential for Practical Implementation | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
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