Publication:

Modeling fluorocarbon plasmas used for etching of Si

Date

2013
Meeting abstract
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dc.contributor.authorTinck, Stefan
dc.contributor.authorMilenin, Alexey
dc.contributor.authorBogaerts, Annemie
dc.contributor.imecauthorMilenin, Alexey
dc.contributor.orcidimecMilenin, Alexey::0000-0003-0747-0462
dc.date.accessioned2021-10-21T12:44:38Z
dc.date.available2021-10-21T12:44:38Z
dc.date.embargo9999-12-31
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23170
dc.source.conferencePlasma Etch and Strip in Microtechnology - PESM
dc.source.conferencedate14/03/2013
dc.source.conferencelocationLeuven Belgium
dc.title

Modeling fluorocarbon plasmas used for etching of Si

dc.typeMeeting abstract
dspace.entity.typePublication
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