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Linking EUV lithography line edge roughness and 16 nm NAND memory performance
Publication:
Linking EUV lithography line edge roughness and 16 nm NAND memory performance
Date
2012
Journal article
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Vaglio Pret, Alessandro
;
Poliakov, Pavel
;
Gronheid, Roel
;
Blomme, Pieter
;
Miranda Corbalan, Miguel
;
Dehaene, Wim
;
Verkest, Diederik
;
Van Houdt, Jan
;
Bianchi, Davide
Journal
Microelectronic Engineering
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1919
since deposited on 2021-10-20
Acq. date: 2025-10-23
Citations
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Views
1919
since deposited on 2021-10-20
Acq. date: 2025-10-23
Citations