Impact of mask corner rounding on pitch 40 nm contact hole variability

dc.contributor.author	van Look, Lieve
dc.contributor.author	Gillijns, Werner
dc.contributor.author	Gallagher, Emily
dc.contributor.imecauthor	van Look, Lieve
dc.contributor.imecauthor	Gillijns, Werner
dc.contributor.imecauthor	Gallagher, Emily
dc.contributor.orcidimec	Gillijns, Werner::0000-0002-2430-7360
dc.contributor.orcidimec	Gallagher, Emily::0000-0002-2927-8298
dc.date.accessioned	2023-01-19T14:20:07Z
dc.date.available	2022-05-22T02:19:05Z
dc.date.available	2023-01-19T14:20:07Z
dc.date.issued	2021
dc.identifier.doi	10.1117/12.2601850
dc.identifier.eisbn	978-1-5106-4553-0
dc.identifier.isbn	978-1-5106-4552-3
dc.identifier.issn	0277-786X
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/39866
dc.publisher	SPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage	1185406
dc.source.conference	International Conference on Extreme Ultraviolet Lithography
dc.source.conferencedate	SEP 27-OCT 01, 2021
dc.source.conferencelocation	Virtual
dc.source.journal	Proceedings of SPIE
dc.source.numberofpages	10
dc.source.volume	11854
dc.title	Impact of mask corner rounding on pitch 40 nm contact hole variability
dc.type	Proceedings paper
dspace.entity.type	Publication
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