Publication:

Development of a wet silicon removal process for replacement metal gate and sacrificial fin

Date

2011
Meeting abstract
Simple item page Full metadata Statistics
 
dc.contributor.authorSuhard, Samuel
dc.contributor.authorSebaai, Farid
dc.contributor.authorPacco, Antoine
dc.contributor.authorVeloso, Anabela
dc.contributor.authorCarbonell, Laure
dc.contributor.authorClaes, Martine
dc.contributor.authorStruyf, Herbert
dc.contributor.authorMertens, Paul
dc.contributor.authorDe Gendt, Stefan
dc.contributor.imecauthorSuhard, Samuel
dc.contributor.imecauthorSebaai, Farid
dc.contributor.imecauthorPacco, Antoine
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-19T19:22:25Z
dc.date.available2021-10-19T19:22:25Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19850
dc.source.beginpage2054
dc.source.conferenceElectrochemical Society Fall Meeting Symposium E7 - Semiconductor Cleaning Science and Technology 12 - SCST 12
dc.source.conferencedate10/10/2011
dc.source.conferencelocationBoston, MA USA
dc.title

Development of a wet silicon removal process for replacement metal gate and sacrificial fin

dc.typeMeeting abstract
dspace.entity.typePublication
Files
Publication available in collections:
Conference contributions