Non-destructive characterization of activated ion-implanted doping profiles based on photomodulated optical reflectance

dc.contributor.author	Bogdanowicz, Janusz
dc.contributor.author	Clarysse, Trudo
dc.contributor.author	Moussa, Alain
dc.contributor.author	Mody, Jay
dc.contributor.author	Eyben, Pierre
dc.contributor.author	Vandervorst, Wilfried
dc.contributor.author	Rosseel, Erik
dc.contributor.imecauthor	Bogdanowicz, Janusz
dc.contributor.imecauthor	Moussa, Alain
dc.contributor.imecauthor	Eyben, Pierre
dc.contributor.imecauthor	Vandervorst, Wilfried
dc.contributor.imecauthor	Rosseel, Erik
dc.contributor.orcidimec	Bogdanowicz, Janusz::0000-0002-7503-8922
dc.date.accessioned	2021-10-19T12:37:20Z
dc.date.available	2021-10-19T12:37:20Z
dc.date.issued	2011
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/18597
dc.source.beginpage	220
dc.source.conference	Ion Implantation Technology 2010. 18th International Conference
dc.source.conferencedate	6/06/2010
dc.source.conferencelocation	Kyoto Japan
dc.source.endpage	224
dc.title	Non-destructive characterization of activated ion-implanted doping profiles based on photomodulated optical reflectance
dc.type	Proceedings paper
dspace.entity.type	Publication
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