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Challenges in line edge roughness metrology in directed self-assembly lithography: placement errors and cross-line correlations
Publication:
Challenges in line edge roughness metrology in directed self-assembly lithography: placement errors and cross-line correlations
Date
2017
Journal article
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39636.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Constantoudis, Vassilios
;
Papvieros, George
;
Gogolides, Evangelos
;
Vaglio Pret, Alessandro
;
Pathangi Sriraman, Hari
;
Gronheid, Roel
Journal
Journal of Micro/Nanolithography MEMS and MOEMS
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Views
1939
since deposited on 2021-10-24
Acq. date: 2025-10-24
Citations
Metrics
Views
1939
since deposited on 2021-10-24
Acq. date: 2025-10-24
Citations