Development of high-chi directed self-assembly process based on key learning from PS-b-PMMA system

dc.contributor.author	Suh, Hyo Seon
dc.contributor.author	Mannaert, Geert
dc.contributor.author	Vandenbroeck, Nadia
dc.contributor.author	Doise, Jan
dc.contributor.imecauthor	Suh, Hyo Seon
dc.contributor.imecauthor	Mannaert, Geert
dc.contributor.imecauthor	Vandenbroeck, Nadia
dc.contributor.imecauthor	Doise, Jan
dc.date.accessioned	2021-10-31T11:29:37Z
dc.date.available	2021-10-31T11:29:37Z
dc.date.issued	2021
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/37216
dc.identifier.url	https://www.spiedigitallibrary.org/conference-proceedings-of-spie/11612/116120P/Development-of-high-chi-directed-self-assembly-process-based-on/10.1117/12.2585169.short?SSO=1
dc.source.beginpage	116120P
dc.source.conference	Advances in Patterning Materials and Processes XXXVIII
dc.source.conferencedate	21/02/2021
dc.source.conferencelocation	online online
dc.title	Development of high-chi directed self-assembly process based on key learning from PS-b-PMMA system
dc.type	Proceedings paper
dspace.entity.type	Publication
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