Publication:
Chemical and structural analysis of etching residue layers in semiconductor devices with energy filtering transmission electron microscopy
Date
| dc.contributor.author | Hens, S. | |
| dc.contributor.author | Van Landuyt, J. | |
| dc.contributor.author | Bender, Hugo | |
| dc.contributor.author | Boullart, Werner | |
| dc.contributor.author | Vanhaelemeersch, Serge | |
| dc.contributor.imecauthor | Bender, Hugo | |
| dc.contributor.imecauthor | Boullart, Werner | |
| dc.contributor.imecauthor | Vanhaelemeersch, Serge | |
| dc.contributor.orcidimec | Boullart, Werner::0000-0001-7614-2097 | |
| dc.contributor.orcidimec | Vanhaelemeersch, Serge::0000-0003-2102-7395 | |
| dc.date.accessioned | 2021-10-14T17:01:38Z | |
| dc.date.available | 2021-10-14T17:01:38Z | |
| dc.date.issued | 2001 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/5340 | |
| dc.source.beginpage | 109 | |
| dc.source.endpage | 111 | |
| dc.source.issue | 1_3 | |
| dc.source.journal | Materials Science in Semiconductor Processing | |
| dc.source.volume | 4 | |
| dc.title | Chemical and structural analysis of etching residue layers in semiconductor devices with energy filtering transmission electron microscopy | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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