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Conference contributions
ALD as an enabler of self-aligned multiple patterning schemes
Publication:
ALD as an enabler of self-aligned multiple patterning schemes
Date
2017
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Van Elshocht, Sven
;
Tao, Zheng
;
Everaert, Jean-Luc
;
Demuynck, Steven
;
Altamirano Sanchez, Efrain
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1920
since deposited on 2021-10-24
Acq. date: 2025-10-23
Citations
Metrics
Views
1920
since deposited on 2021-10-24
Acq. date: 2025-10-23
Citations