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The effect of polyether suppressors on the nucleation and growth of copper on RuTa seeded substrate for direct copper plating

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dc.contributor.authorNagar, Magi
dc.contributor.authorRadisic, Alex
dc.contributor.authorStrubbe, Katrien
dc.contributor.authorVereecken, Philippe
dc.contributor.imecauthorRadisic, Alex
dc.contributor.imecauthorVereecken, Philippe
dc.contributor.orcidimecVereecken, Philippe::0000-0003-4115-0075
dc.date.accessioned2021-10-22T04:10:31Z
dc.date.available2021-10-22T04:10:31Z
dc.date.issued2014
dc.identifier.issn0013-4686
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24305
dc.identifier.urlhttp://www.sciencedirect.com/science/article/pii/S0013468614003545
dc.source.beginpage315
dc.source.endpage326
dc.source.journalElectrochimica Acta
dc.source.volume127
dc.title

The effect of polyether suppressors on the nucleation and growth of copper on RuTa seeded substrate for direct copper plating

dc.typeJournal article
dspace.entity.typePublication
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