Publication:

34 nm Pitch Orthogonal Pillar Patterning Enabled by Different Mask Geometries

Date

2024
Proceedings Paper
https://doi.org/10.1117/12.3034675
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cris.virtual.orcid0009-0002-5784-619X
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cris.virtualsource.department0589bf6f-5e0f-4149-be36-f10e7e682cbb
cris.virtualsource.department734cef21-bf1f-4bae-a353-f5959e3c0c84
cris.virtualsource.department31b689ec-9081-4e90-a023-687176ebb434
cris.virtualsource.orcid0589bf6f-5e0f-4149-be36-f10e7e682cbb
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dc.contributor.authorRaut, H. K.
dc.contributor.authorHasan, Mahmudul
dc.contributor.authorDas, Arijit
dc.contributor.authorPak, Murat
dc.contributor.imecauthorRaut, H. K.
dc.contributor.imecauthorHasan, M.
dc.contributor.imecauthorDas, A.
dc.contributor.imecauthorPak, M.
dc.date.accessioned2025-08-29T03:57:12Z
dc.date.available2025-08-29T03:57:12Z
dc.date.issued2024
dc.identifier.doi10.1117/12.3034675
dc.identifier.eisbn978-1-5106-8158-3
dc.identifier.isbn978-1-5106-8157-6
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/46130
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage132161N
dc.source.conference2024 Conference on Photomask Technology
dc.source.conferencedate2024-09-29
dc.source.conferencelocationMonterey
dc.source.journalProceedings of SPIE
dc.source.numberofpages13
dc.title

34 nm Pitch Orthogonal Pillar Patterning Enabled by Different Mask Geometries

dc.typeProceedings paper
dspace.entity.typePublication
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