Publication:

Post-etch cleaning after dry etching the emitter windows to improve the bipolar characteristics in a 0.5 µm BiCMOS technology

Date

1994
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorDecoutere, Stefaan
dc.contributor.authorVanhaelemeersch, Serge
dc.contributor.authorDeferm, Ludo
dc.contributor.authorVleugels, Frank
dc.contributor.authorVancuyck, Geert
dc.contributor.imecauthorDecoutere, Stefaan
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.imecauthorDeferm, Ludo
dc.contributor.imecauthorVleugels, Frank
dc.contributor.imecauthorVancuyck, Geert
dc.contributor.orcidimecDecoutere, Stefaan::0000-0001-6632-6239
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.date.accessioned2021-09-29T12:40:49Z
dc.date.available2021-09-29T12:40:49Z
dc.date.embargo9999-12-31
dc.date.issued1994
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/129
dc.source.beginpage137
dc.source.conference24th European Solid State Device Research Conference - ESSDERC
dc.source.conferencedate11/09/1994
dc.source.conferencelocationEdinburgh UK
dc.source.endpage140
dc.title

Post-etch cleaning after dry etching the emitter windows to improve the bipolar characteristics in a 0.5 µm BiCMOS technology

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
121.pdf
Size:
334.05 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions