Publication:
Deep levels in oxygenated n-type high-resistivity FZ silicon before and after a low-temperature hydrogenation step
Date
| dc.contributor.author | Simoen, Eddy | |
| dc.contributor.author | Claeys, Cor | |
| dc.contributor.author | Job, R. | |
| dc.contributor.author | Ulyashin, A.G. | |
| dc.contributor.author | Fahrner, W.R. | |
| dc.contributor.author | Tonelli, G. | |
| dc.contributor.author | De Gryse, O. | |
| dc.contributor.author | Clauws, P. | |
| dc.contributor.imecauthor | Simoen, Eddy | |
| dc.contributor.orcidimec | Simoen, Eddy::0000-0002-5218-4046 | |
| dc.date.accessioned | 2021-10-15T06:39:18Z | |
| dc.date.available | 2021-10-15T06:39:18Z | |
| dc.date.issued | 2003 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/8140 | |
| dc.source.beginpage | G520 | |
| dc.source.endpage | G526 | |
| dc.source.issue | 9 | |
| dc.source.journal | Journal of the Electrochemical Society | |
| dc.source.volume | 150 | |
| dc.title | Deep levels in oxygenated n-type high-resistivity FZ silicon before and after a low-temperature hydrogenation step | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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