Publication:

Surface preparation and interfacial stability of high-k dielectrics deposited by atomic layer chemical vapor deposition

Date

2003

Journal article

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Author(s)

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Carter, Richard

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Nohira, Hiroshi

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Conard, Thierry

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Cosnier, Vincent

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De Gendt, Stefan

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Richard, Olivier

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Vandervorst, Wilfried

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Journal

Microelectronic Engineering

Statistics

1987 since deposited on 2021-10-15

Acq. date: 2026-02-24