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Surface preparation and interfacial stability of high-k dielectrics deposited by atomic layer chemical vapor deposition
Publication:
Surface preparation and interfacial stability of high-k dielectrics deposited by atomic layer chemical vapor deposition
Date
2003
Journal article
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Tsai, Wilman
;
Carter, Richard
;
Nohira, Hiroshi
;
Caymax, Matty
;
Conard, Thierry
;
Cosnier, Vincent
;
De Gendt, Stefan
;
Heyns, Marc
;
Petry, Jasmine
;
Richard, Olivier
;
Vandervorst, Wilfried
;
Young, Edward
;
Zhao, Chao
;
Maes, Jan
;
Tuominen, M.
;
Schulte, W.H.
;
Garfunkel, E.
;
Gustafsson, T.
Journal
Microelectronic Engineering
Abstract
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1983
since deposited on 2021-10-15
Acq. date: 2025-10-23
Citations
Metrics
Views
1983
since deposited on 2021-10-15
Acq. date: 2025-10-23
Citations