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The formation and removal of residue formed during TiN fluorocarbon plasma etching
Publication:
The formation and removal of residue formed during TiN fluorocarbon plasma etching
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Date
1998
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Kim, Young-Chang
;
Conard, Thierry
;
Vanhaeren, Danielle
;
Baklanov, Mikhaïl
;
Vanhaelemeersch, Serge
;
Vandervorst, Wilfried
;
Maex, Karen
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1865
since deposited on 2021-09-30
Acq. date: 2025-12-09
Citations
Metrics
Views
1865
since deposited on 2021-09-30
Acq. date: 2025-12-09
Citations