Publication:

Sub 0.1 mm nMOSFETs fabricated using experimental design techniques to optimise performance and minimise process sensitivity

Date

1995
Proceedings Paper
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dc.contributor.authorKubicek, Stefan
dc.contributor.authorBiesemans, Serge
dc.contributor.authorWang, Qingfeng
dc.contributor.authorMaex, Karen
dc.contributor.authorDe Meyer, Kristin
dc.contributor.imecauthorKubicek, Stefan
dc.contributor.imecauthorBiesemans, Serge
dc.contributor.imecauthorMaex, Karen
dc.contributor.imecauthorDe Meyer, Kristin
dc.date.accessioned2021-09-29T13:08:38Z
dc.date.available2021-09-29T13:08:38Z
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/710
dc.source.beginpage105
dc.source.conference1995 Symposium on VLSI Technology. Digest of Technical Papers; 6-8 June 1995; Kyoto, Japan.
dc.source.conferencelocation
dc.source.endpage106
dc.title

Sub 0.1 mm nMOSFETs fabricated using experimental design techniques to optimise performance and minimise process sensitivity

dc.typeProceedings paper
dspace.entity.typePublication
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