Publication:

22nm node imaging and beyond: a comparison of EUV and ArFi double patterning

Date

2010
Proceedings Paper
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dc.contributor.authorvan Setten, Eelco
dc.contributor.authorMouraille, O.
dc.contributor.authorWittebrood, F.
dc.contributor.authorDusa, Mircea
dc.contributor.authorvan Ingen-Schenau, Koen
dc.contributor.authorFinders, Jo
dc.contributor.authorFeenstra, Kees
dc.contributor.authorBekaert, Joost
dc.contributor.authorLaenens, Bart
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorErcken, Monique
dc.contributor.authorHendrickx, Eric
dc.contributor.authorVandenberghe, Geert
dc.contributor.imecauthorDusa, Mircea
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorErcken, Monique
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.date.accessioned2021-10-18T23:13:49Z
dc.date.available2021-10-18T23:13:49Z
dc.date.embargo9999-12-31
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18201
dc.source.conferenceInternational Symposium on Lithography Extensions
dc.source.conferencedate20/10/2010
dc.source.conferencelocationKobe Japan
dc.title

22nm node imaging and beyond: a comparison of EUV and ArFi double patterning

dc.typeProceedings paper
dspace.entity.typePublication
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