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Rectification of EUV-patterned contact holes using directed self-assembly

Date

2013
Proceedings Paper
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dc.contributor.authorGronheid, Roel
dc.contributor.authorSingh, Arjun
dc.contributor.authorYounkin, Todd
dc.contributor.authorRincon Delgadillo, Paulina
dc.contributor.authorNealey, Paul
dc.contributor.authorChan, BT
dc.contributor.authorNafus, Kathleen
dc.contributor.authorRomo Negreira, Ainhoa
dc.contributor.authorSomervell, Mark
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorSingh, Arjun
dc.contributor.imecauthorRincon Delgadillo, Paulina
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorRomo Negreira, Ainhoa
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.date.accessioned2021-10-21T08:02:19Z
dc.date.available2021-10-21T08:02:19Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22437
dc.source.beginpage86820A
dc.source.conferenceAdvances in Resist Materials and Processing Technology XXX
dc.source.conferencedate25/02/2013
dc.source.conferencelocationSan Diego, CA USA
dc.title

Rectification of EUV-patterned contact holes using directed self-assembly

dc.typeProceedings paper
dspace.entity.typePublication
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