Publication:

Electrochemically etched multilayer porous silicon stack used as intermediate Bragg reflector in thin film solar cells

Date

2009
Proceedings Paper
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dc.contributor.authorVan Hoeymissen, Jan
dc.contributor.authorKuzma Filipek, Izabela
dc.contributor.authorVan Nieuwenhuysen, Kris
dc.contributor.authorPoortmans, Jef
dc.contributor.imecauthorKuzma Filipek, Izabela
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.date.accessioned2021-10-18T04:11:42Z
dc.date.available2021-10-18T04:11:42Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16391
dc.source.conference5th Kurt Schwabe Symposium: From Corrosion to Semiconductors
dc.source.conferencedate24/05/2009
dc.source.conferencelocationErlangen Germany
dc.title

Electrochemically etched multilayer porous silicon stack used as intermediate Bragg reflector in thin film solar cells

dc.typeProceedings paper
dspace.entity.typePublication
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