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Ab-intio based electron-phonon scattering for 2D materials within the NEGF framework

 
dc.contributor.authorGaddemane, Gautam
dc.contributor.authorDuflou, Rutger
dc.contributor.authorSankaran, Kiroubanand
dc.contributor.authorPourtois, Geoffrey
dc.contributor.authorHoussa, Michel
dc.contributor.authorAfzalian, Aryan
dc.contributor.imecauthorGaddemane, Gautam
dc.contributor.imecauthorDuflou, Rutger
dc.contributor.imecauthorSankaran, Kiroubanand
dc.contributor.imecauthorPourtois, Geoffrey
dc.contributor.imecauthorHoussa, Michel
dc.contributor.imecauthorAfzalian, Aryan
dc.contributor.orcidimecHoussa, Michel::0000-0003-1844-3515
dc.contributor.orcidimecDuflou, Rutger::0000-0002-0357-1293
dc.contributor.orcidimecSankaran, Kiroubanand::0000-0001-6988-7269
dc.contributor.orcidimecPourtois, Geoffrey::0000-0003-2597-8534
dc.contributor.orcidimecAfzalian, Aryan::0000-0002-5260-0281
dc.date.accessioned2022-05-02T09:21:11Z
dc.date.available2022-05-02T09:21:11Z
dc.date.issued2021
dc.identifier.doi10.1109/SISPAD54002.2021.9592532
dc.identifier.eisbn978-1-6654-0685-7
dc.identifier.issn1946-1569
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/39725
dc.publisherIEEE
dc.source.beginpage167
dc.source.conferenceInternational Conference on Simulation of Semiconductor Processes and Devices (SISPAD)
dc.source.conferencedateSEP 27-29, 2021
dc.source.conferencelocationDallas
dc.source.endpage170
dc.source.journalna
dc.source.numberofpages4
dc.title

Ab-intio based electron-phonon scattering for 2D materials within the NEGF framework

dc.typeProceedings paper
dspace.entity.typePublication
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