Publication:

Extreme scaling of optical lithography: overview of process integration issues

Date

2009
Presentation
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dc.contributor.authorRonse, Kurt
dc.contributor.authorWiaux, Vincent
dc.contributor.authorVerhaegen, Staf
dc.contributor.authorVan Look, Lieve
dc.contributor.authorBekaert, Joost
dc.contributor.authorLaidler, David
dc.contributor.authorCheng, Shaunee
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorDusa, Mircea
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorLaidler, David
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorDusa, Mircea
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecLaidler, David::0000-0003-4055-3366
dc.date.accessioned2021-10-18T02:28:17Z
dc.date.available2021-10-18T02:28:17Z
dc.date.embargo9999-12-31
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16137
dc.source.conferenceOptical Microlithography XXII
dc.source.conferencedate22/02/2009
dc.source.conferencelocationSan Jose, CA USA
dc.title

Extreme scaling of optical lithography: overview of process integration issues

dc.typeOral presentation
dspace.entity.typePublication
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