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Modeling and experimental investigation of the plasma uniformity in CF4/O2 capacitively coupled plasmas, operating in single frequency and dual frequency regime

Date

2015
Journal article
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dc.contributor.authorZhang, Yu-Ru
dc.contributor.authorTinck, Stefan
dc.contributor.authorDe Schepper, Peter
dc.contributor.authorWang, You-Nian
dc.contributor.authorBogaerts, Annemie
dc.contributor.imecauthorDe Schepper, Peter
dc.date.accessioned2021-10-23T01:36:33Z
dc.date.available2021-10-23T01:36:33Z
dc.date.embargo9999-12-31
dc.date.issued2015
dc.identifier.issn0734-2101
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26245
dc.identifier.urlhttp://scitation.aip.org/content/avs/journal/jvsta/33/2/10.1116/1.4906819
dc.source.beginpage21310
dc.source.issue2
dc.source.journalJournal of Vacuum Science and Technology A
dc.source.volume33
dc.title

Modeling and experimental investigation of the plasma uniformity in CF4/O2 capacitively coupled plasmas, operating in single frequency and dual frequency regime

dc.typeJournal article
dspace.entity.typePublication
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