Publication:
Interactions between imaging layers during LPLE double patterning lithography
Date
| dc.contributor.author | Robertson, Stewart | |
| dc.contributor.author | Wong, Patrick | |
| dc.contributor.author | De Bisschop, Peter | |
| dc.contributor.author | Vandenbroeck, Nadia | |
| dc.contributor.author | Wiaux, Vincent | |
| dc.contributor.imecauthor | Wong, Patrick | |
| dc.contributor.imecauthor | De Bisschop, Peter | |
| dc.contributor.imecauthor | Vandenbroeck, Nadia | |
| dc.contributor.imecauthor | Wiaux, Vincent | |
| dc.contributor.orcidimec | Wong, Patrick::0000-0003-3605-9680 | |
| dc.date.accessioned | 2021-10-20T15:16:40Z | |
| dc.date.available | 2021-10-20T15:16:40Z | |
| dc.date.embargo | 9999-12-31 | |
| dc.date.issued | 2012 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/21399 | |
| dc.source.beginpage | 83260B | |
| dc.source.conference | Optical Microlithography XXV | |
| dc.source.conferencedate | 12/02/2012 | |
| dc.source.conferencelocation | San Jose, CA USA | |
| dc.title | Interactions between imaging layers during LPLE double patterning lithography | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | Original bundle
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| Publication available in collections: |