Publication:
Optical emission during the plasma etch for process control of the litho-etch bias
Date
| dc.contributor.author | Altamirano Sanchez, Efrain | |
| dc.contributor.author | Kunnen, Eddy | |
| dc.contributor.author | Boullart, Werner | |
| dc.contributor.imecauthor | Altamirano Sanchez, Efrain | |
| dc.contributor.imecauthor | Boullart, Werner | |
| dc.contributor.orcidimec | Boullart, Werner::0000-0001-7614-2097 | |
| dc.date.accessioned | 2021-10-16T15:00:24Z | |
| dc.date.available | 2021-10-16T15:00:24Z | |
| dc.date.issued | 2007 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/11639 | |
| dc.source.beginpage | 377 | |
| dc.source.conference | International Symposium on Semiconductor Manufacturing | |
| dc.source.conferencedate | 15/10/2007 | |
| dc.source.conferencelocation | Santa Clara, CA USA | |
| dc.source.endpage | 379 | |
| dc.title | Optical emission during the plasma etch for process control of the litho-etch bias | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
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