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Electron relaxation times and resistivity in metallic nanowires due to tilted grain boundary planes

Date

2015
Proceedings Paper
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dc.contributor.authorMoors, Kristof
dc.contributor.authorSoree, Bart
dc.contributor.authorTokei, Zsolt
dc.contributor.authorMagnus, Wim
dc.contributor.imecauthorSoree, Bart
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorMagnus, Wim
dc.contributor.orcidimecSoree, Bart::0000-0002-4157-1956
dc.date.accessioned2021-10-22T21:14:07Z
dc.date.available2021-10-22T21:14:07Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25668
dc.identifier.urlhttp://ieeexplore.ieee.org/xpl/articleDetails.jsp?arnumber=7063748
dc.source.beginpage201
dc.source.conferenceJoint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon - EUROSOI-ULIS
dc.source.conferencedate26/01/2015
dc.source.conferencelocationBologna Italy
dc.source.endpage204
dc.title

Electron relaxation times and resistivity in metallic nanowires due to tilted grain boundary planes

dc.typeProceedings paper
dspace.entity.typePublication
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