Publication:
Growth of epitaxial b-FeSi2 on (100) silicon using Fe-Ti-Si diffusion couples
Date
| dc.contributor.author | Kyllesbech Larsen, K. | |
| dc.contributor.author | Tavares, J. | |
| dc.contributor.author | Bender, Hugo | |
| dc.contributor.author | Donaton, R. A. | |
| dc.contributor.author | Lauwers, A. | |
| dc.contributor.author | Maex, Karen | |
| dc.contributor.imecauthor | Bender, Hugo | |
| dc.contributor.imecauthor | Maex, Karen | |
| dc.date.accessioned | 2021-09-29T13:08:43Z | |
| dc.date.available | 2021-09-29T13:08:43Z | |
| dc.date.issued | 1995 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/712 | |
| dc.source.beginpage | 599 | |
| dc.source.endpage | 601 | |
| dc.source.issue | 1 | |
| dc.source.journal | J. Appl. Phys. | |
| dc.source.volume | 78 | |
| dc.title | Growth of epitaxial b-FeSi2 on (100) silicon using Fe-Ti-Si diffusion couples | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
| Publication available in collections: |