Publication:
Addressing Key Challenges for SiGe-pFin Technologies: Fin Integrity, Low-D-IT Si-cap-free Gate Stack and Optimizing the Channel Strain
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1921 since deposited on 2021-11-02
2last month
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Acq. date: 2026-03-16
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Statistics
Views
1921 since deposited on 2021-11-02
2last month
1last week
Acq. date: 2026-03-16
Citations