Publication:
Addressing Key Challenges for SiGe-pFin Technologies: Fin Integrity, Low-D-IT Si-cap-free Gate Stack and Optimizing the Channel Strain
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1918 since deposited on 2021-11-02
1last month
Acq. date: 2025-12-15
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Metrics
Views
1918 since deposited on 2021-11-02
1last month
Acq. date: 2025-12-15
Citations