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Ex situ bubble generation, enhancing the particle removal rate for single wafer megasonic cleaning processes

Date

2008
Proceedings Paper
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dc.contributor.authorHolsteyns, Frank
dc.contributor.authorJanssens, Tom
dc.contributor.authorArnauts, Sophia
dc.contributor.authorVan der Putte, W.
dc.contributor.authorMinsier, Vincent
dc.contributor.authorBrunner, J.
dc.contributor.authorStraka, J.
dc.contributor.authorMertens, Paul
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorArnauts, Sophia
dc.contributor.imecauthorMertens, Paul
dc.date.accessioned2021-10-17T07:43:09Z
dc.date.available2021-10-17T07:43:09Z
dc.date.embargo9999-12-31
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13885
dc.source.beginpage201
dc.source.conferenceUltra Clean Processing of Semiconductor Surfaces VIII - UCPSS
dc.source.conferencedate18/09/2006
dc.source.conferencelocationAntwerpen Belgium
dc.source.endpage204
dc.title

Ex situ bubble generation, enhancing the particle removal rate for single wafer megasonic cleaning processes

dc.typeProceedings paper
dspace.entity.typePublication
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