Advanced high voltage e-beam system combined with an enhanced D2DB for on-device overlay measurement

dc.contributor.author	Kang, Seulki
dc.contributor.author	Maruyama, Kotaro
dc.contributor.author	Yamazaki, Yuichiro
dc.contributor.author	Beggiato, Matteo
dc.contributor.author	Veloso, Anabela
dc.contributor.author	Lorusso, Gian
dc.contributor.imecauthor	Beggiato, Matteo
dc.contributor.imecauthor	Veloso, Anabela
dc.contributor.imecauthor	Lorusso, Gian
dc.contributor.orcidimec	Beggiato, Matteo::0000-0003-0873-9021
dc.date.accessioned	2023-11-29T08:07:02Z
dc.date.available	2023-07-28T17:39:55Z
dc.date.available	2023-11-29T08:07:02Z
dc.date.issued	2023
dc.identifier.doi	10.1117/12.2661180
dc.identifier.eisbn	978-1-5106-6100-4
dc.identifier.isbn	978-1-5106-6099-1
dc.identifier.issn	0277-786X
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/42232
dc.publisher	SPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage	Art. 124961W
dc.source.conference	Conference on Metrology, Inspection, and Process Control XXXVII
dc.source.conferencedate	FEB 27-MAR 02, 2023
dc.source.conferencelocation	San Jose
dc.source.journal	Proceedings of SPIE
dc.source.numberofpages	10
dc.source.volume	12496
dc.title	Advanced high voltage e-beam system combined with an enhanced D2DB for on-device overlay measurement
dc.type	Proceedings paper
dspace.entity.type	Publication
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