Wafer based aberration metrology for lithographic systems using overlay measurements on targets imaged from phase-shift gratings

dc.contributor.author	van Haver, Sven
dc.contributor.author	Coene, Wim M.J.
dc.contributor.author	D'have, Koen
dc.contributor.author	Geypen, Niels
dc.contributor.author	Van Adrichem, Paul
dc.contributor.author	de Winter, Laurens
dc.contributor.author	Janssen, Augustus J.E.M.
dc.contributor.author	Cheng, Shaunee
dc.contributor.imecauthor	D'have, Koen
dc.contributor.imecauthor	Van Adrichem, Paul
dc.contributor.orcidimec	D'have, Koen::0000-0002-5195-9241
dc.date.accessioned	2021-10-22T07:13:23Z
dc.date.available	2021-10-22T07:13:23Z
dc.date.issued	2014
dc.identifier.issn	0003-6935
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/24696
dc.identifier.url	http://www.opticsinfobase.org/ao/abstract.cfm?uri=ao-53-12-2562
dc.source.beginpage	2562
dc.source.endpage	2582
dc.source.issue	12
dc.source.journal	Applied Optics
dc.source.volume	53
dc.title	Wafer based aberration metrology for lithographic systems using overlay measurements on targets imaged from phase-shift gratings
dc.type	Journal article
dspace.entity.type	Publication
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