Publication:

Atomic layer deposition of Ru and RuO2 for MIMCAP applications

Date

2009
Meeting abstract
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dc.contributor.authorZhao, Chao
dc.contributor.authorPawlak, Malgorzata
dc.contributor.authorSchaekers, Marc
dc.contributor.authorSleeckx, Erik
dc.contributor.authorVancoille, Eric
dc.contributor.authorWouters, Dirk
dc.contributor.authorTokei, Zsolt
dc.contributor.authorKittl, Jorge
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorSleeckx, Erik
dc.contributor.imecauthorVancoille, Eric
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.contributor.orcidimecSleeckx, Erik::0000-0003-2560-6132
dc.date.accessioned2021-10-18T05:45:38Z
dc.date.available2021-10-18T05:45:38Z
dc.date.embargo9999-12-31
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16606
dc.source.beginpage2052
dc.source.conference216th ECS Meeting
dc.source.conferencedate4/10/2009
dc.source.conferencelocationVienna Austria
dc.title

Atomic layer deposition of Ru and RuO2 for MIMCAP applications

dc.typeMeeting abstract
dspace.entity.typePublication
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