Publication:

Effect of rapid thermal annealing on the mechanical stress and physico-chemical properties in plasma enhanced atomic layer deposited silicon nitride thin films

Date

2022
Journal article
https://doi.org/10.1116/6.0001922
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dc.contributor.authorPeter, Antony
dc.contributor.authorSepulveda Marquez, Alfonso
dc.contributor.authorMeersschaut, Johan
dc.contributor.authorDara, Praveen
dc.contributor.authorBlanquart, Timothee
dc.contributor.authorTomomi, Takayama
dc.contributor.authorTaishi, Ebisudani
dc.contributor.authorElichiro, Shiba
dc.contributor.authorKimura, Yosuke
dc.contributor.authorVan Gompel, Sander
dc.contributor.authorMorin, Pierre
dc.contributor.imecauthorPeter, Antony
dc.contributor.imecauthorSepulveda Marquez, Alfonso
dc.contributor.imecauthorMeersschaut, Johan
dc.contributor.imecauthorDara, Praveen
dc.contributor.imecauthorKimura, Yosuke
dc.contributor.imecauthorVan Gompel, Sander
dc.contributor.imecauthorMorin, Pierre
dc.contributor.orcidimecDara, Praveen::0000-0002-2334-3976
dc.contributor.orcidimecKimura, Yosuke::0000-0002-3876-9363
dc.contributor.orcidimecMeersschaut, Johan::0000-0003-2467-1784
dc.contributor.orcidimecKimura, Yosuke::0000-0002-9098-0414
dc.contributor.orcidimecMorin, Pierre::0000-0002-4637-496X
dc.contributor.orcidimecPeter, Antony::0000-0001-5941-0563
dc.contributor.orcidimecSepulveda Marquez, Alfonso::0000-0003-4726-177X
dc.date.accessioned2023-08-07T10:08:31Z
dc.date.available2023-06-20T10:33:28Z
dc.date.available2023-08-07T10:08:31Z
dc.date.embargo9999-12-31
dc.date.issued2022
dc.identifier.doi10.1116/6.0001922
dc.identifier.issn2166-2746
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/41810
dc.publisherA V S AMER INST PHYSICS
dc.source.beginpageArt. 054001
dc.source.endpagena
dc.source.issue5
dc.source.journalJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
dc.source.numberofpages11
dc.source.volume40
dc.subject.keywordsLPCVD
dc.subject.keywordsTECHNOLOGY
dc.subject.keywordsCHALLENGES
dc.subject.keywordsDENSITY
dc.subject.keywordsSPACER
dc.title

Effect of rapid thermal annealing on the mechanical stress and physico-chemical properties in plasma enhanced atomic layer deposited silicon nitride thin films

dc.typeJournal article
dspace.entity.typePublication
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