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Guidelines for reducing NBTI based on its correlation with effective work function studied by CV-BTI on high-k first MOS capacitors with slant etched SiO2
Publication:
Guidelines for reducing NBTI based on its correlation with effective work function studied by CV-BTI on high-k first MOS capacitors with slant etched SiO2
Date
2014
Proceedings Paper
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28524.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Arimura, Hiroaki
;
Ragnarsson, Lars-Ake
;
Schram, Tom
;
Albert, Johan
;
Kaczer, Ben
;
Degraeve, Robin
;
Bury, Erik
;
Aoulaiche, Marc
;
Kauerauf, Thomas
;
Thean, Aaron
;
Horiguchi, Naoto
;
Groeseneken, Guido
Journal
Abstract
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1
since deposited on 2021-10-22
Acq. date: 2025-10-22
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1960
since deposited on 2021-10-22
Acq. date: 2025-10-22
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Metrics
Downloads
1
since deposited on 2021-10-22
Acq. date: 2025-10-22
Views
1960
since deposited on 2021-10-22
Acq. date: 2025-10-22
Citations