Guidelines for reducing NBTI based on its correlation with effective work function studied by CV-BTI on high-k first MOS capacitors with slant etched SiO2

Arimura, Hiroaki; Ragnarsson, Lars-Ake; Schram, Tom; Albert, Johan; Kaczer, Ben; Degraeve, Robin; Bury, Erik; Aoulaiche, Marc; Kauerauf, Thomas; Thean, Aaron; Horiguchi, Naoto; Groeseneken, Guido

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1 since deposited on 2021-10-22

Acq. date: 2025-12-08

1962 since deposited on 2021-10-22

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Acq. date: 2025-12-08

Guidelines for reducing NBTI based on its correlation with effective work function studied by CV-BTI on high-k first MOS capacitors with slant etched SiO2

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